0.1-μm high performance double heterojunction In0.32Al0.68As/In0.33Ga0.67As metamorphic HEMTs on GaAs

Author:

Zaknoune M,Cordier Y,Bollaert S,Ferre D,Théron D,Crosnier Y

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Metamorphic InAlAs/InGaAs HEMT’s on GaAs substrates with a novel composite channels design;Chertouk;IEEE Electron Device Lett,1996

2. A 0.1-μm Al0.5In0.5As/Ga0.5In0.5As MODFET fabricated on GaAs substrates;Wang;IEEE Trans Electron Devices,1988

3. A InAlAs/InGaAs metamorphic HEMT with high current density and high breakdown voltage;Zaknoune;IEEE Electron Device Lett,1998

4. Salmer G, Cordier Y. Metamorphics: extending the limits of GaAs. Proceedings of 27th European Solid-State Device Research Conference, Stuttgart, September 1997, p. 77–87

5. Material properties of compositional graded InxGa1-xAs and InxAl1-xAs epilayers grown on GaAs substrates;Chyi;J Appl Phys,1996

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