1. Plasma Etching of Silicon with Nitrogen Trifluoride;Eisele,1981
2. Comparison of the Etching and Plasma Characteristics of Discharges in CF4 and NF3;Ianno;J. Electrochem. Soc.,1981
3. Plasma Etching characteristics of Si and SiO2 in NF3/Ar and NF3/He Plasmas;Golja;The Electrochemical Society Extended Abstracts, Washington, D.C.,1983
4. Dry Etching Using NF3/AR and NF3/He Plasmas;Barkanic,1984
5. Anisotropic Etching of SiO2 in Low-Frequency CF4/O2 and NF3/Ar Plasmas;Donnelly;J. Applied Physics,1984