Measurement of optical constants of thin a-C:H films
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference9 articles.
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2. Plasma Deposited Thin Films;Angus,1986
3. Amorphous carbon films as resist masks with high reactive ion etching resistance for nanometer lithography;Kakuchi;Appl. Phys. Lett.,1986
4. Scanning-tunneling-microscopy based lithography employing amorphous hydrogenated carbon as a high-resolution resist mask;Kragler;Appl. Phys. Lett.,1995
5. Lithographic evaluation of the hydrogenated amorphous carbon film;Martino;J. Vac. Sci. Technol. B,1995
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