Scanning tunneling microscopy based lithography employing amorphous hydrogenated carbon as a high resolution resist mask-Reference-Cited by-同舟云学术

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Scanning tunneling microscopy based lithography employing amorphous hydrogenated carbon as a high resolution resist mask

Published:1995-08-21 Issue:8 Volume:67 Page:1163-1165
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Kragler K.,Günther E.,Leuschner R.,Falk G.,Hammerschmidt A.,von Seggern H.,Saemann–Ischenko G.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.114995

Reference12 articles.

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Optical pump-probe measurements of sound velocity and thermal conductivity of hydrogenated amorphous carbon films;Journal of Applied Physics;2008-08

4. X-ray absorption spectroscopy (XAS) study of dip deposited a-C:H(OH) thin films;Journal of Physics: Condensed Matter;2004-08-03

5. Amorphous carbon films prepared by the “dip” technique: Deposition and film characterization;Journal of Applied Physics;2003-07-15

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