Carrier gas and ion beam parameter effects on the structure and properties of a-C:H/SiOx films deposited employing closed drift ion beam source
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference36 articles.
1. Interpretation of the hardness of worn DLC particles using micro-Raman spectroscopy
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3. Mechanical properties of a-C:H thin films deposited by r.f. PECVD method
4. Protective diamond-like coatings for optical materials and electronic devices
5. Diamond-like carbon protective anti-reflection coating for Si solar cell
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3. Dependence of Mechanical and Tribological Properties of a-C:H:SiOx Films on the Bias Voltage Amplitude of the Substrate;Technical Physics;2021-10
4. Effect of the plasma confinement on properties of a-C:H:SiOx films grown by plasma enhanced chemical vapor deposition;Journal of Vacuum Science & Technology A;2019-12
5. Effect of deposition conditions on optical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method;Optik;2018-11
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