Combined molecular dynamics simulations and reaction kinetics study on wettability of trimethylsilyl functionalized silicon surfaces

Author:

Jeong Hyunhak,Kim ByungjoORCID,Park Taeuk,Yoo Suyoung,Nam Sang Ki

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,General Physics and Astronomy,Condensed Matter Physics,Surfaces and Interfaces,General Chemistry

Reference61 articles.

1. Influence of plasma cleaning on silicon die back adhesion performance;Su,2009

2. Effect of poly silicon wettability on polymeric residue contamination;Kang;ECS Trans,2007

3. Effects of fluorine contamination on spin-on dielectric thickness in semiconductor manufacturing;Kim,2018

4. EUV resist materials for 16 nm and below half pitch applications;Tarutani;J. Photopolym. Sci. Technol.,2012

5. M. Glodde, D.L. Goldfarb, Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography, US10096477B2, 2018. https://patents.google.com/patent/US10096477B2/en (accessed April 25, 2022).

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