Author:
Pal Satyendra,Bhatt P,Kumar J
Subject
Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Instrumentation
Reference29 articles.
1. D.M. Manos, D.L. Flamm (Eds.), Plasma Etching, Academic Press, Boston, 1989.
2. Consequences of asymmetric pumping in low pressure plasma processing reactors: A three-dimensional modeling study
3. T.E. Graedel, P.J. Crutzen, Chemie der Atmosphare, Spektrum Akademischer, Heidelberg, 1994.
4. H. Tawara, in: T. Watnable, I. Shimamura, S. Shimizu, Y. Itikawa (Eds.), Molecular Processes in Space, Plenum Publication, Japan, 1990.
5. A critical evaluation of low-energy electron impact cross sections for plasma processing modeling. I: Cl2, F2, and HCl
Cited by
14 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献