Facile synthesis of nanoscale high porosity IR-MOFs for low-k dielectrics thin films-Reference-Cited by-同舟云学术

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Facile synthesis of nanoscale high porosity IR-MOFs for low-k dielectrics thin films

Published:2016-02 Issue: Volume:221 Page:40-47
ISSN:1387-1811
Container-title:Microporous and Mesoporous Materials
language:en
Short-container-title:Microporous and Mesoporous Materials

Author:

Guo Hailing,Wang Mei,Liu Junjuan,Zhu Shujie,Liu Chenguang

Funder

National Natural Science Foundation of China

Shandong Provincial Natural Science Foundation

Fundamental Research Funds for the Central Universities

Qingdao Application of Basic Research Projects

China University of Petroleum (East China)

Publisher

Elsevier BV

Subject

Mechanics of Materials,Condensed Matter Physics,General Materials Science,General Chemistry

Reference66 articles.

1. Structural Change in Porous Silica Thin Film after Plasma Treatment

2. In Search of Low- k Dielectrics

3. The International Technology Roadmap for Semiconductors—Perspectives and challenges for the next 15 years

4. Low Dielectric Constant Materials for IC Applications;Ho,2003

5. Ultra-Low-k Pure-Silica Zeolite MFI Films Using Cyclodextrin as Porogen

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