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Low temperature (<150 °C) annealed amorphous indium-gallium-tin oxide (IGTO) thin-film for flash memory application

  • Published:2022-12 Issue: Volume:605 Page:154614
  • ISSN:0169-4332
  • Container-title:Applied Surface Science
  • language:en
  • Short-container-title:Applied Surface Science

Author:

Wang Zeli,Xu Hongwei,Zhang Yuanju,Cho Hyeon Cheol,Jeong Jae Kyeong,Choi Changhwan

Funder

Ministry of Science, ICT and Future Planning

National Research Foundation of Korea

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference45 articles.

1. Array Architectures for 3-D NAND Flash Memories;Micheloni;Proc. IEEE,2017

2. 3D Semicircular Flash Memory Cell: Novel Split-Gate Technology to Boost Bit Density;Fujiwara;IEDM,2019

3. Scaling and Reliability of NAND Flash Devices;Park;Proc. IEEE IRPS,2014

4. Scaling Trends in NAND Flash;Parat;IEDM,2018

5. Bit Cost Scalable Technology with Punch and Plug Process for Ultra High Density Flash Memory;Tanaka;VLS,2007

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