The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition-Reference-Cited by-同舟云学术

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The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition

Published:2022-06 Issue: Volume:586 Page:152679
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Brady-Boyd A.,O'Connor R.,Armini S.,Selvaraju V.,Pasquali M.,Hughes G.,Bogan J.

Funder

Horizon 2020 Framework Programme

H2020 Marie Skłodowska-Curie Actions

Science Foundation Ireland

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference58 articles.

1. Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development;Sheng;J. Vac. Sci. Technol. A.,2018

2. Atomic layer deposition (ALD) of metal gates for CMOS;Zhao;Appl. Sci.,2019

3. State of the art and future perspectives in advanced CMOS technology;Radamson;Nanomaterials.,2020

4. Atomic layer deposition - Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis;Lu;Surf. Sci. Rep.,2016

5. Area-selective deposition: fundamentals, applications, and future outlook;Parsons;Chem. Mater.,2020

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2. Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms;Nanomaterials;2024-07-16

3. Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light;Nanomaterials;2024-06-05

4. Effects of storage conditions on the performance of an electrochemical aptamer-based sensor;Sensors & Diagnostics;2024

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