Surface chemistry and optimization of focused ion beam iodine-enhanced etching of indium phosphide

Author:

Callegari Victor,Nellen Philipp M.,Yang Tianhe,Hauert Roland,Müller Ulrich,Hernández-Ramírez Francisco,Sennhauser Urs

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Enhancing the focused ion beam etch rate of Ag films by Joule heating;Journal of Vacuum Science & Technology B;2018-11

2. Review Article: Advanced nanoscale patterning and material synthesis with gas field helium and neon ion beams;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-05

3. Laser-Assisted Focused He+ Ion Beam Induced Etching with and without XeF2 Gas Assist;ACS Applied Materials & Interfaces;2016-10-17

4. AES and EELS tools associated to TRIM simulation methods to study nanostructures on III-V semiconductor surfaces;IOP Conference Series: Materials Science and Engineering;2012-02-07

5. Analysis of the propagation losses of InP/InGaAsP trench waveguides fabricated by focused ion beam;Microelectronic Engineering;2010-11

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