Evolution of HF etching rate of borosilicate glass by friction-induced damages-Reference-Cited by-同舟云学术

Evolution of HF etching rate of borosilicate glass by friction-induced damages

Published:2020-05 Issue: Volume:512 Page:144789
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Qiao Qian,He Hongtu^ORCID,Yu Jiaxin

Funder

Education Department of Sichuan Province

National Natural Science Foundation of China

Southwest University of Science and Technology

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference32 articles.

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3. A review of wet chemical etching of glasses in hydrofluoric acid based solution for thin film silicon solar cell application;Park;Curr. Photovol. Res.,2017

4. Etching characteristics of local wet etching of silicon in HF/HNO3 mixtures;Kazuya;Surf. Interface Anal.,2008

5. Detailed characterization of anodic bonding process between glass and thin-film coated silicon substrates;Lee;Sens. Actuat. A: Phys.,2000

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