Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering-Reference-Cited by-同舟云学术

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Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering

Published:2017-12 Issue: Volume:425 Page:646-653
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kozak A.O.,Porada O.K.,Ivashchenko V.I.,Ivashchenko L.A.,Scrynskyy P.L.,Tomila T.V.,Manzhara V.S.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference32 articles.

1. Characterization of thick and thin film SiCN for pressure sensing at high temperatures;Leo;Sensors,2010

2. Plasmapolymerized silicon organic thin films from HMDSN for capacitive humidity sensors;Kraus;Sens. Actuators B,2003

3. Growth rate and sensing properties of plasma deposited silicon organic thin films from hexamethyldisilazane compound;Saloum;Acta Phys. Pol. A,2010

4. eValuation of corrosion resistance of SiCN-coated metals deposited on an NH3-radical-treated substrate;Harada;Thin Solid Films,2011

5. Super H2O-barrier film using Cat-CVD (HWCVD)-grown SiCN for film-based electronics;Nakayama;Thin Solid Films,2011

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