Growth Rate and Sensing Properties οf Plasma Deposited Silicon Organic Thin Films from Hexamethyldisilazane Compound
Author:
Affiliation:
1. Atomic Energy Commission of Syria (AECS), Physics Department, P.O. Box 6091, Damascus, Syria
Publisher
Institute of Physics, Polish Academy of Sciences
Subject
General Physics and Astronomy
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Effect of substrate bias on the properties of plasma deposited organosilicone (pp-HMDSN) thin films;Optoelectronics Letters;2023-05
2. SiCxNyOz Coatings Enhance Endothelialization and Bactericidal activity and Reduce Blood Cell Activation;ACS Biomaterials Science & Engineering;2020-08-19
3. Hydrogenated Silicon Carbonitride Thin Film Nanostructuring Using SF6 Plasma: Structural and Optical Analysis;Silicon;2020-01-23
4. Effect of surface modification on the properties of plasma‐polymerized hexamethyldisiloxane thin films;Surface and Interface Analysis;2019-04-12
5. Structural, optoelectronic and mechanical properties of PECVD Si-C-N films: An effect of substrate bias;Materials Science in Semiconductor Processing;2018-12
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