Hydrogenated Silicon Carbonitride Thin Film Nanostructuring Using SF6 Plasma: Structural and Optical Analysis
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
http://link.springer.com/content/pdf/10.1007/s12633-020-00392-7.pdf
Reference53 articles.
1. Khatami Z, Bosco GBF, Wojcik J, Tessler LR, Mascher P (2018a) Influence of deposition conditions on the characteristics of luminescent silicon carbonitride thin films. ECS J Solid State Sc 7:N7–N14. https://doi.org/10.1149/2.0151802jss
2. Kuo D-H, Yang D-G (2000) Plasma-enhanced chemical vapor deposition of silicon carbonitride using hexamethyldisilazane and nitrogen. Thin Solid Films 374:92–97. https://doi.org/10.1016/S0040-6090(00)01194-9
3. Peng Y, Zhou J, Lei G, Gan Y, Chen Y (2019) Microstructure and blue photoluminescence of hydrogenated silicon carbonitride thin films. Surf Rev Lett 26:1850177. https://doi.org/10.1142/S0218625X18501779
4. Khatami Z, Wilson PRJ, Wojcik J, Mascher P (2017) The influence of carbon on the structure and photoluminescence of amorphous silicon carbonitride thin films. Thin Solid Films 622:1–10. https://doi.org/10.1016/j.tsf.2016.12.014
5. Kozak AO, Ivashchenko VI, Porada OK, Ivashchenko LA, Tomila TV, Manjara VS, Klishevych GV (2018) Structural, optoelectronic and mechanical properties of PECVD Si-C-N films: an effect of substrate bias. Mat Sci Semicon Proc 88:65–72. https://doi.org/10.1016/j.mssp.2018.07.023
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