Plasma-enhanced chemical vapor deposition of silicon carbonitride using hexamethyldisilazane and nitrogen-Reference-Cited by-同舟云学术

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Plasma-enhanced chemical vapor deposition of silicon carbonitride using hexamethyldisilazane and nitrogen

Published:2000-10 Issue:1 Volume:374 Page:92-97
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kuo Dong-Hau,Yang Dong-Gi

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. (Ti1−xAlx)N coatings by plasma‐enhanced chemical vapor deposition

2. Compositionally gradient (Ti1−xAlx)N coatings made by plasma enhanced chemical vapor deposition

3. Plasma-Enhanced Chemical Vapour Deposition of Coatings in the System Ti-B-N

4. Ti-Si-N films prepared by plasma-enhanced chemical vapor deposition

5. Superhard nanocrystalline composite materials: The TiN/Si3N4 system

Cited by 57 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of plasma power on growth process, chemical structure, and properties of PECVD films produced from hexamethyldisilane and ammonia;Surface and Coatings Technology;2024-08

2. Amorphous silicon carbonitride (a‐SiCN) thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of substrate temperature;Plasma Processes and Polymers;2022-12-27

3. Amorphous silicon carbonitride a‐SiCN thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of plasma composition;Plasma Processes and Polymers;2022-11-29

4. SiOC films on C/C composite prepared by chemical vapor deposition with hexamethyldisilazane precursor;Ceramics International;2022-07

5. Organosilicon compounds as single-source precursors for SiCN films production;Journal of Organometallic Chemistry;2022-01

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