Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)
Author:
Funder
National Natural Science Foundation of China
Sichuan Province Science and Technology Support Program
Publisher
Elsevier BV
Reference74 articles.
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1. Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping;Applied Surface Science;2025-01
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3. Experimental study and DFT+U calculations on the impact of Rare-Earth ion (La3+, Sm3+, Y3+, Yb3+) doped CeO2 Core-Shell abrasives on polishing performance;Applied Surface Science;2024-12
4. Scratching properties of 4H–SiC single crystal after oxidation under different conditions;Wear;2024-11
5. Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives;Tribology International;2024-09
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