Spectroscopic ellipsometry characterization of amorphous and crystalline TiO 2 thin films grown by atomic layer deposition at different temperatures-Reference-Cited by-同舟云学术

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Spectroscopic ellipsometry characterization of amorphous and crystalline TiO 2 thin films grown by atomic layer deposition at different temperatures

Published:2014-10 Issue: Volume:315 Page:116-123
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Saha D.,Ajimsha R.S.,Rajiv K.,Mukherjee C.,Gupta M.,Misra P.,Kukreja L.M.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference38 articles.

1. Investigation on sol–gel synthesized Ag-doped TiO2 cermet thin films;Sen;Thin Solid Films,2005

2. Implementing TiO2 as gate dielectric for Ge-channel complementary metal-oxide semiconductor devices by using HfO2/GeO2 interlayer;Xie;Appl. Phys. Lett.,2010

3. Al-doped TiO2 films with ultralow leakage currents for next generation DRAM capacitors;Kim;Adv. Mater.,2008

4. TiO2-based transparent conducting oxides: the search for optimum electrical conductivity using a combinatorial approach;Kafizas;J. Mater. Chem. C,2013

5. Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings;Szeghalmi;Appl. Opt.,2009

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