Microstructure and interfacial properties of HfO2–Al2O3 nanolaminate films-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Microstructure and interfacial properties of HfO2–Al2O3 nanolaminate films

Published:2006-07 Issue:18 Volume:252 Page:6206-6211
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Liu M.,He G.,Zhu L.Q.,Fang Q.,Li G.H.,Zhang L.D.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference17 articles.

1. Reduction of the interfacial Si displacement of ultrathin SiO2 on Si(100) formed by atmospheric-pressure ozone

2. Characterization of SiO2/Si(100) interface structure of ultrathin SiO2films using spatially resolved electron energy loss spectroscopy

3. Dielectric functions and optical bandgaps of high-K dielectrics for metal-oxide-semiconductor field-effect transistors by far ultraviolet spectroscopic ellipsometry

4. Interface of ultrathin HfO2 films deposited by UV-photo-CVD

5. Theoretical and experimental investigation of boron diffusion in polycrystalline HfO2 films

Cited by 35 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Multilayer heterogeneous electrical insulation structure of HfO2/Al2O3 for high-temperature thin-film sensor on superalloy substrate;Applied Surface Science;2024-01

2. Investigation of crystallization in nanolayered TiO2-based superlattices;Surfaces and Interfaces;2023-10

3. Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times;Journal of Vacuum Science & Technology A;2023-09-05

4. Vacuum annealing effects on the microstructure and properties of HfO2-based bilayer antireflective coatings by magnetron sputtering;Vacuum;2023-09

5. Effect of Y2O3 interlayer on the electric properties of Y-doped HfO2 film deposited by chemical solution deposition;Ceramics International;2023-03

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3