Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering-Reference-Cited by-同舟云学术

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Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering

Published:2010-01 Issue:6 Volume:256 Page:1694-1697
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cai Yongan,Liu Wei,He Qing,Zhang Yi,Yu Tao,Sun Yun

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference33 articles.

1. Transparent conductive Al-doped ZnO films for liquid crystal displays

2. Aluminum-doped zinc oxide films as transparent conductive electrode for organic light-emitting devices

3. 19·9%-efficient ZnO/CdS/CuInGaSe2 solar cell with 81·2% fill factor

4. Organic solar cells on indium tin oxide and aluminum doped zinc oxide anodes

5. Recent development on surface-textured ZnO:Al films prepared by sputtering for thin-film solar cell application

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1. The measurement and impact of negative oxygen ions during reactive sputter deposition;Critical Reviews in Solid State and Materials Sciences;2023-09-21

2. Comparative Study of Aluminum-Doped Zinc Oxide, Gallium-Doped Zinc Oxide and Indium-Doped Tin Oxide Thin Films Deposited by Radio Frequency Magnetron Sputtering;Nanomaterials;2022-05-02

3. Selected properties of Al_xZn_yO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target;Beilstein Journal of Nanotechnology;2022-03-31

4. Measurement of negative ion fluxes during DC reactive magnetron sputtering of Ti in Ar/O2 atmosphere using a magnetic-filtering probe;Vacuum;2021-12

5. Ab initio study of photoelectric properties in ZnO transparent conductive oxide;Vacuum;2021-09

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