Growth and characterization of Ta/Ti bi-layer films on glass and Si (111) substrates by direct current magnetron sputtering-Reference-Cited by-同舟云学术

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Growth and characterization of Ta/Ti bi-layer films on glass and Si (111) substrates by direct current magnetron sputtering

Published:2012-07 Issue:19 Volume:258 Page:7314-7321
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhou Y.M.,Xie Z.,Ma Y.Z.,Xia F.J.,Feng S.L.

Funder

Fundamental Research Funds

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference22 articles.

1. Nanocrystalline tetragonal tantalum thin films

2. The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films

3. Tantalum films for protective coatings of steel

4. Annealing effects of tantalum thin films sputtered on [001] silicon substrate

5. Under-layer behavior study of low resistance Ta/TaNx barrier film

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1. Influence of Tantalum Surface Layer Parameters on X-Ray Contrast;Inorganic Materials: Applied Research;2023-06

2. Study of Co-Deposition of Tantalum and Titanium during the Formation of Layered Composite Materials by Magnetron Sputtering;Coatings;2023-01-07

3. Sacrificial Materials and Release Etchants for Metal MEMS That Reduce or Eliminate Hydrogen-Induced Residual Stress Change;Journal of Microelectromechanical Systems;2021-06

4. Influence of ion treatment in the production of thin multilevel surface layers;Journal of Physics: Conference Series;2021-06-01

5. Compression and decompression of structural tantalum films exposed to buffered hydrofluoric acid;Journal of Micromechanics and Microengineering;2020-04-21

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