Influence of ion treatment in the production of thin multilevel surface layers

Abstract

Abstract The regularities of the formation of titanium and tantalum multilayers with the use of magnetron sputtering and ion bombardment were investigated depending on the varied technological parameters. Metallic composite materials had a multilayer structure. The surface morphology at low radiation doses in the course of preliminary ion etching corresponds to the substrate surface morphology. With a long duration/energy of ion bombardment, a thin surface structure in the form of point depressions is observed, smoothed by a layer deposited from above, and the length of the layer and its crystallinity also increase. The transition layer ensures high adhesion of the surface layer to the substrate.