Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference35 articles.
1. A 90nm high volume manufacturing logic technology featuring novel 45 nm gate length strained silicon CMOS transistors;Ghani;IEDM Tech Dig.,2003
2. A 90-nm logic technology featuring strained-silicon;Thompson;IEEE Trans. Electron Dev.,2004
3. Enhanced performance in 50 nm N-MOSFETs with silicon-carbon source/drain regions;Ang;IEDM Tech Dig.,2004
4. Application of selective Si:C epitaxy for recessed source/drain technology;Kim;ECS Trans.,2006
5. Enhancing CMOS transistor performance using lattice-mismatched materials in source/drain regions;Yeo;Semicond. Sci. Technol.,2007
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