Ultrasonic flexural vibration assisted chemical mechanical polishing for sapphire substrate-Reference-Cited by-同舟云学术

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Ultrasonic flexural vibration assisted chemical mechanical polishing for sapphire substrate

Published:2010-04 Issue:12 Volume:256 Page:3936-3940
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Xu Wenhu,Lu Xinchun,Pan Guoshun,Lei Yuanzhong,Luo Jianbin

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference20 articles.

1. Correlation of crystallographic orientation with processing of sapphire optics

2. Growth and applications of Group III-nitrides

3. Group III nitride semiconductors for short wavelength light-emitting devices

4. InGaN-BASED LASER DIODES

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1. Characterization of ultrasonic vibration and polishing force in sapphire ultrasonic vibration-assisted flexible polishing: Insights from in-situ monitoring systems;Ultrasonics;2025-01

2. Advanced polishing methods for atomic-scale surfaces: A review;Materials Today Sustainability;2024-09

3. Chemical mechanical polishing of sapphire elucidated by densely discrete phase model and verified using atomic force microscopy;Tribology International;2024-09

4. A review on the development of ceria for chemical mechanical polishing;Powder Technology;2024-08

5. Simulation and experimental investigation of material removal profile based on ultrasonic vibration polishing of K9 optical glass;Tribology International;2024-08

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