Chemical mechanical polishing of sapphire elucidated by densely discrete phase model and verified using atomic force microscopy-Reference-Cited by-同舟云学术

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Chemical mechanical polishing of sapphire elucidated by densely discrete phase model and verified using atomic force microscopy

Published:2024-09 Issue: Volume:197 Page:109834
ISSN:0301-679X
Container-title:Tribology International
language:en
Short-container-title:Tribology International

Author:

Zhou Mufang,Zhong Min,Xu Wenhu,Yi Meirong,Li Xiaobing,Chen Jianfeng

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference65 articles.

1. Effects of polishing parameters on surface quality in sapphire double-sided CMP;Li;Ceram Int,2020

2. Effects of surfactants on the chemical mechanical polishing performance of a-plane sapphire substrates;Chen;Ecs J Solid State Sci Technol,2023

3. Study on material removal mechanism of sapphire wafer with CeO2 coated diamond composite abrasives via green polishing;Xu;J Manuf Process,2023

4. Effects of quantities and pole-arrangements of magnets on the magneto-rheological polishing (MRP) performance of sapphire hemisphere. Appl Surf Sci 2022;584:152589.

5. Chemical mechanical polishing for sapphire wafers using a developed slurry;Zhang;J Manuf Process,2021

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