Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications-Reference-Cited by-同舟云学术

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Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications

Published:2013-01 Issue: Volume:264 Page:21-26
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhou H.P.,Wei D.Y.,Xu L.X.,Guo Y.N.,Xiao S.Q.,Huang S.Y.,Xu S.

Funder

National Research Foundation

Agency for Science, Technology and Research for Singapore

8th Singapore-China Joint Grant

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference26 articles.

1. Low temperature silicon oxide and nitride for surface passivation of silicon solar cells

2. Experimental evidence of parasitic shunting in silicon nitride rear surface passivated solar cells

3. Detailed study of the composition of hydrogenated SiNx layers for high-quality silicon surface passivation

4. Carrier recombination at silicon–silicon nitride interfaces fabricated by plasma-enhanced chemical vapor deposition

5. Highest-quality surface passivation of low-resistivity p-type silicon using stoichiometric PECVD silicon nitride

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1. Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition;Materials Science in Semiconductor Processing;2023-09

2. Influence of CIGS film thickness on the microstructure, bulk optoelectronic, and surface electrical properties;Journal of Materials Science: Materials in Electronics;2021-10-23

3. Anticorrosive Behavior of SiCxNyOz Film Formed by Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane, Nitrogen and Argon Gases;ECS Journal of Solid State Science and Technology;2020-01-02

4. Monolithic crystalline silicon solar cells with SiN layers doped with Tb3+ and Yb3+ rare-earth ions;Journal of Rare Earths;2019-05

5. High‐Density Plasma‐Enhanced Chemical Vapor Deposition of Si‐Based Materials for Solar Cell Applications;Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices;2016-08-31

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