Initial stage of NO adsorption on Si(100)-(2×1) studied by synchrotron radiation photoemission and photodesorption
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference24 articles.
1. NH3and NO interaction with Si(100)-(2×1) surfaces
2. Initial stages of the thermal nitridation of the Si(100) surface with NH3 and NO: a surface sensitive study of Si 2p core-level shifts
3. Adsorption of CO on Si(100)-(2 × 1) at room temperature
4. Interaction of CO with silicon single-crystal surfaces studied by HREELS, UPS and TPD
5. STM studies of Si(100)-2×1 oxidation: defect chemistry and Si ejection
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1. Pathways of NO adsorption on Si(100)2×1 by van der Waals corrected DFT;Journal of Theoretical and Computational Chemistry;2017-03
2. Early stage oxynitridation process of Si(001) surface by NO gas: Reactive molecular dynamics simulation study;Journal of Applied Physics;2016-03-28
3. Theoretical Investigation of Ge(100) Nitridation by Nitric Oxide: Monomeric or Dimeric Dissociation?;The Journal of Physical Chemistry C;2013-08-07
4. Effect of Ion Energies on the Surface Interactions of NO Formed in Nitrogen Oxide Plasma Systems;The Journal of Physical Chemistry A;2012-11-28
5. A scanning Kelvin probe for synchrotron investigations: thein situdetection of radiation-induced potential changes;Journal of Synchrotron Radiation;2011-11-25
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