Sticking probability and adsorption process of NH3 on Si(100) surface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference27 articles.
1. Reaction of Si(100) single crystals with nitrogen atoms
2. Reaction of Si(100) with NH3: Rate-Limiting Steps and Reactivity Enhancement via Electronic Excitation
3. Imaging chemical-bond formation with the scanning tunneling microscope:NH3dissociation on Si(001)
4. Photoemission study of ammonia dissociation on Si(100) below 700 K
5. General comparison of the surface processes involved in nitridation of Si(100)-2×1byNH3and inSiNxfilm deposition: a photoemission study
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4. Low-temperature CVD of η-Mn3N2−x from bis[di(tert-butyl)amido]manganese(II) and ammonia;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-05
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