Membranes of SiOxNy with 3D topography formed by PECVD for MEMS applications
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. High quality low temperature DPECVD silicon dioxide
2. Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition
3. On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
4. Thick SiO x N y and SiO 2 films obtained by PECVD technique at low temperatures
5. Characterization of High Rate Deposited PECVD Silicon Dioxide Films for MCM Applications
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1. Silicon Oxide‐Rich Diamond‐Like Carbon: A Conformal, Ultrasmooth Thin Film Material with High Thermo‐Oxidative Stability;Advanced Materials Interfaces;2018-11-28
2. Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films;Journal of Structural Chemistry;2017-01
3. Silicon Nitride Films Deposited by RF Sputtering for Microstructure Fabrication in MEMS;Journal of Electronic Materials;2009-06-03
4. Silicon oxynitride-based integrated optical switch;SPIE Proceedings;2009-02-12
5. MEMS-based incandescent microlamps for integrated optics applications;Journal of Optics A: Pure and Applied Optics;2008-09-02
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