Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition

Published:2001-08 Issue:1-3 Volume:288 Page:88-95
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Scopel W.L.,Cuzinatto R.R.,Tabacniks M.H.,Fantini M.C.A.,Alayo M.I.,Pereyra I.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Physicochemical Properties of Chemical Vapor‐Deposited Silicon Oxynitride from a SiH4 ‐ CO 2 ‐ NH 3 ‐ H 2 System

2. Fabrication and characterization of graded refractive index silicon oxynitride thin films

3. Thick SiO x N y and SiO 2 films obtained by PECVD technique at low temperatures

4. High quality low temperature DPECVD silicon dioxide

5. Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition

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1. Ab initio thermochemistry study of polymorphism in the Si2N2(NH) analog of Si2N2O;Computational Materials Science;2021-12

2. Optical and morphological properties of silicon dioxide thin films;Journal of Materials Science: Materials in Electronics;2015-10-13

3. Nanocrystal Formation in Silicon Oxy-Nitride Films for Photovoltaic Applications: Optical and Electrical Properties;The Journal of Physical Chemistry C;2015-06-04

4. Fabrication and characterization of aluminum nitride pedestal-type optical waveguide;Canadian Journal of Physics;2014-07

5. Electrical, optical and structural investigation of plasma-enhanced chemical-vapor-deposited amorphous silicon oxynitride films for solar cell applications;Solar Energy Materials and Solar Cells;2013-01

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