High quality low temperature DPECVD silicon dioxide
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference15 articles.
1. Low-pressure chemical vapor deposition for very large-scale integration processing—A review
2. Thermal nitridation of Si and SiO2for VLSI
3. Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation
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