Xe+-irradiation effects on multilayer thin-film optical surfaces in EUV lithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Xe+-irradiation effects on multilayer thin-film optical surfaces in EUV lithography

Published:2006-01 Issue:1-2 Volume:242 Page:520-522
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Allain J.P.,Hassanein A.,Allain M.M.C.,Heuser B.J.,Nieto M.,Chrobak C.,Rokusek D.,Rice B.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference4 articles.

1. Extreme ultraviolet light sources for use in semiconductor lithography—state of the art and future development

2. Plasma sources for EUV lithography exposure tools

3. Improved reflectance and stability of Mo-Si multilayers

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Unraveling atomic-level self-organization at the plasma-material interface;Journal of Physics D: Applied Physics;2017-06-28

2. Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes;Plasma Sources Science and Technology;2015-04-29

3. Table-top soft x-ray microscope using laser-induced plasma from a pulsed gas jet;Optics Express;2014-09-18

4. Computer Simulation of the Origination Porosity;Advanced Structured Materials;2012

5. Computer simulation of blistering in multilayer mirrors for EUV lithography;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2010-06

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP