Author:
Clarysse T.,Vandervorst W.,Lin R.,Petersen D.H.,Nielsen P.F.
Subject
Instrumentation,Nuclear and High Energy Physics
Cited by
6 articles.
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1. Bevel depth profiling by high-spatial-resolution sputtered neutral mass spectrometry with laser postionization;Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena;2018-05
2. Ladungsträger-Tiefenprofilierung an ultra-flachen pn-Übergängen;Vakuum in Forschung und Praxis;2013-06
3. Review of electrical characterization of ultra-shallow junctions with micro four-point probes;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-01
4. Millisecond flash lamp annealing of shallow implanted layers in Ge;Applied Physics Letters;2009-12-21
5. Micro-four-point probe Hall effect measurement method;Journal of Applied Physics;2008-07