Microprobe PIXE study of Ni–Ge interactions in lateral diffusion couples-Reference-Cited by-同舟云学术

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Microprobe PIXE study of Ni–Ge interactions in lateral diffusion couples

Published:2015-11 Issue: Volume:363 Page:161-166
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Chilukusha D.,Pineda-Vargas C.A.,Nemutudi R.,Habanyama A.,Comrie C.M.

Funder

South African National Research Foundation

Zambian National Science and Technology Council

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference22 articles.

1. Germanium MOS capacitors incorporating ultrathin high-/spl kappa/ gate dielectric

2. Thin film reaction of transition metals with germanium

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of Highly n-Type-Doped Germanium Nanowires and Ohmic Contacts Using Ion Implantation and Flash Lamp Annealing;ACS Applied Electronic Materials;2022-11-02

2. Interface Control Processes for Ni/Ge and Pd/Ge Schottky and Ohmic Contact Fabrication: Part Two;Advanced Material and Device Applications with Germanium;2018-10-03

3. Inter-Diffusion of Nickel and Palladium with Germanium;Intermetallic Compounds - Formation and Applications;2018-05-30

4. Corrosion resistance of Ni-based coatings deposited by spray and fuse technique varying oxygen flow;Surface and Coatings Technology;2017-07

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