Sputtering of silicon at glancing incidence

Author:

Lindsey S.,Hobler G.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference20 articles.

1. A review of focused ion beam milling techniques for TEM specimen preparation

2. Sputtering yields;Eckstein,2007

3. M. Maazouz, FEI Company, Hillsboro, OR, Private Communication.

4. Nanoscale effects in focused ion beam processing

5. J.F. Ziegler, M.D. Ziegler, J.P. Biersack, SRIM 2008.04. http://www.srim.org.

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