Etude par spectroscopie d'emission optique de decharges radiofrequence et micro-onde lors du depot chimique en phase vapeur (PACVD) dans le systeme Si-C-H-Ar-Reference-Cited by-同舟云学术

Etude par spectroscopie d'emission optique de decharges radiofrequence et micro-onde lors du depot chimique en phase vapeur (PACVD) dans le systeme Si-C-H-Ar

Published:1998-07 Issue:5-6 Volume:23 Page:743-752
ISSN:0151-9107
Container-title:Annales de Chimie Science des Matériaux
language:en
Short-container-title:Annales de Chimie Science des Matériaux

Author:

ANDRIEUX M,BADIE J,DUCARROIR M,THOMAS L

Publisher

Elsevier BV

Subject

Materials Chemistry

Reference22 articles.

1. Electric Probe For Plasma Diagnostic;Swift,1970

2. Characterisation of a DC titanium tetraisopropoxide/H2/N2 plasma using emission spectroscopy;Kulakowska-Pawlak;Thin Solid Films,1995

3. Optical emisson spectroscopy on an industrial PACVD system for titanium nitride;Hochreiter;Surf. Coat Tech.,1995

4. Optical emisson spectroscopy of active species in a TICN PVD arc discharge;Baravian;Surf. Coat. Tech.,1995

5. A spectroscopic investigation of growth reimes in Silane-Ammonia discharges used for plasma nitride deposition;Hicks;Plasma Chem. Plasma Process.,1991

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-pressure ethane/nitrogen gas mixture plasma surface modification effect on the wetting and electrochemical performance of polymeric separator for lithium-ion batteries;Journal of the Taiwan Institute of Chemical Engineers;2014-11

2. Electrical Measurements and Optical Emission Spectroscopy of Silicon–Carbon Alloys Grown by PACVD: Correlation with Film Microstructure;Chemical Vapor Deposition;2003-06-17

3. Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics;Surface and Coatings Technology;2001-07

4. Properties of a-C:H Coatings Prepared by PECVD for Laser Fusion Targets;Fusion Technology;2000-07

5. Les différentes voies de modélisation macroscopique du procédé de dépôt de SiC par voie gazeuse;Annales de Chimie Science des Matériaux;1998-07