On the formation of amorphous Al2Pt phase in heat-treated multilayers and high temperature sequential deposition
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Reference21 articles.
1. Reaction kinetics of nickel/silicon multilayer films
2. Nucleation‐limited phase selection during reactions in nickel/amorphous‐silicon multilayer thin films
3. Calorimetric analysis of thin‐film reactions: Experiments and modeling in the nickel/silicon system
4. Icosahedral Phase Formation in Vacuum Deposited Thin Films
5. Growth and Characterization of Quasicrystals: I.Thin Films and II. Fine Particles
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Energetics of nucleation for the icosahedral Al-Mn phase in HTSD-deposited thin films;Structural Chemistry;2002
2. Formation of metastable phases during heat treatment of multilayers in the Al–Pt system;Journal of Applied Physics;2001-12-15
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