Deposition of fluorocarbon polymer films in a dielectric barrier discharge (DBD)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference5 articles.
1. Low Temperature Plasma Physics;Hippler,2001
2. I.P. Vinogradov et al. 15th ISPC, Orleans, France, 2001, p. 263
3. Plasma abatement of perfluorocompounds in inductively coupled plasma reactors
4. CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization
5. The use of ?actinometer? gases in optical diagnostics of plasma etching mixtures: SF6-O2
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