Author:
Elinson V M,Shvedov A V,Kukushkin D Yu
Abstract
Abstract
This paper presents the results of a study of the formation of fluorocarbon coatings obtained by using a low-frequency plasmatron of a low-temperature atmospheric pressure plasma in a dynamic mode of deposition. The main dependences of chemical vapor deposition (CVD) are investigated. The absorption spectra in the UV range was studied, and the band gap was determined by the Tauc method.
Subject
General Physics and Astronomy
Cited by
1 articles.
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1. SURFACE PROPERTIES OF FLUOROCARBON COATINGS PRODUCED BY LOW-FREQUENCY PLASMATRON AT ATMOSPHERIC PRESSURE;High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes;2023