A novel reactive magnetron sputtering technique for producing insulating oxides of metal alloys and other compound thin films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference19 articles.
1. Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates
2. High rate reactive sputtering using gas pulsing: a technique for the creation of films onto large, flat substrates
3. Sputtering of indium-tin oxide
4. The properties of reactively sputtered, stoichiometry-controlled and optimum-conductivity transparent zinc/aluminium oxide films as a function of their aluminium content
5. The properties of reactively-sputtered, stoichiometry-controlled and optimum-conductivity transparent indium oxide films as a function of their titanium, aluminium and zinc content; comparisons with the use of tin as a dopant
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1. Algorithms for optical control of reactive magnetron deposition of film coatings;Journal of Applied Spectroscopy;2012-07
2. Characterization of an Ar/O2magnetron plasma by a multi-species Monte Carlo model;Plasma Sources Science and Technology;2011-06-13
3. Entwicklung neuer PVD-Beschichtungen;Umweltverträgliche Tribosysteme;2010
4. Effects of oxygen addition to argon glow discharges: A hybrid Monte Carlo-fluid modeling investigation;Spectrochimica Acta Part B: Atomic Spectroscopy;2009-11
5. Particle-in-cell/Monte Carlo collisions treatment of an Ar/O2magnetron discharge used for the reactive sputter deposition of TiOxfilms;New Journal of Physics;2009-10-05
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