Sputtering of indium-tin oxide
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference5 articles.
1. these Proceedings;Howson,1997
2. The formation and control of direct current magnetron discharges for the high‐rate reactive processing of thin films
3. The reactive sputtering of oxides and nitrides
4. Pressure stability in reactive magnetron sputtering
5. Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Fundamentals and Applications;Howson,1993
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