Laser-assisted plasma-enhanced chemical vapor deposition of silicon nitride thin film-Reference-Cited by-同舟云学术

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Laser-assisted plasma-enhanced chemical vapor deposition of silicon nitride thin film

Published:2000-10 Issue:2-3 Volume:132 Page:158-162
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Tsai Hung-Sheng,Jaw Gwo-Juinn,Chang Sheng-Hsiung,Cheng Chao-Chia,Lee Ching-Ting,Liu Hai-Pei

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. Film Deposition by Plasma Techniques;Konuma,1992

2. Handbook of Chemical Vapor Deposition;Pierson,1992

3. Silicon Nitride Thin Insulating Films;Valco,1983

4. Preparation of a ‐ SiN x Thin Film with Low Hydrogen Content by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

5. Gate quality Si3N4 prepared by low temperature remote plasma enhanced chemical vapor deposition for III–V semiconductor-based metal–insulator–semiconductor devices

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1. State of the art, trends, and opportunities for oxide epitaxy;APL Materials;2024-04-01

2. Two-step fabrication of thin film encapsulation using laser assisted chemical vapor deposition and laser assisted plasma enhanced chemical vapor deposition for long-lifetime organic light emitting diodes;Organic Electronics;2021-04

3. P‐232: Laser Assisted Plasma Enhanced Chemical Vapor Deposition for Damage‐Resistive and Reliable Thin Film Encapsulation of Organic Light Emitting Diodes;SID Symposium Digest of Technical Papers;2020-08

4. Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiNx for Low Temperature Thin Film Encapsulation;Micromachines;2020-01-13

5. Effect of CO₂ Laser on SiN_x Films Fabricated by Low-Temperature Laser-Assisted Plasma Enhanced Chemical Vapor Deposition;Nanoscience and Nanotechnology Letters;2016-07-01

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