Nitrogen flow rate dependence of the growth morphology of TiAlN films deposited by reactive sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference8 articles.
1. Titanium aluminum nitride films: A new alternative to TiN coatings
2. Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N films
3. Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al
4. A model for development of orientation of vapour deposits
5. Superhard nanocomposite Ti1−xAlxN films prepared by magnetron sputtering
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1. Effects of nitrogen flow rate on the microstructure and mechanical and tribological properties of TiAlN films prepared via reactive magnetron sputtering;Ceramics International;2023-06
2. Study on the Preparation, Annealing of Altin Multilayer Film and Their Structure, Mechanical Properties;SSRN Electronic Journal;2022
3. Variation on the Microstructure and Mechanical Properties of Ti-Al-N Films Induced by RF-ICP Ion Source Enhanced Reactive Nitrogen Plasma Atmosphere;Nanoscale Research Letters;2020-05-24
4. Correlation of Microstructural and Mechanical Properties of CVD Deposited TiAlN Coatings;Arabian Journal for Science and Engineering;2019-10-28
5. Effects of nitrogen-argon flow ratio on the microstructural and mechanical properties of TiAlSiN/CrN multilayer coatings prepared using high power impulse magnetron sputtering;Journal of Vacuum Science & Technology A;2019-09
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