Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering-Reference-Cited by-同舟云学术

Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputtering

Published:2001-07 Issue: Volume:142-144 Page:348-354
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Mišina Martin,Shaginyan Leonid R.,Maček Marijan,Panjan Peter

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference11 articles.

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3. Internal stresses in amorphous silicon films deposited by cylindrical magnetron sputtering using Ne, Ar, Kr, Xe, and Ar+H2;Thornton;J. Vac. Sci. Technol.,1981

4. Energy-resolved mass spectrometry and Monte Carlo simulation of atomic transport in magnetron sputtering;Kadlec;Surf. Coat. Technol.,1997

5. Characterisation of DC unbalanced magnetron deposition of Ni/C:H composite films;Zeuner;Vacuum,1998

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