Author:
Shindo H.,Koromogawa T.,Fujii T.,Kusaba K.,Horiike Y.
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference4 articles.
1. A review of the plasma oxidation of silicon and its applications
2. Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
3. Proc. 15th Symp. Reactive Plasma, Hamamatsu, Japan;Koromogawa,1998
4. Abstr. 44th Nat. Symp. of American Vacuum Society, San Jose;Shindo,1997
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