Properties of Ti1Si N films deposited by concurrent cathodic arc evaporation and magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Preparation and some properties of chemically vapour-deposited Si3N4-TiN composite
2. Microstructure of Si3N4-TiN composites prepared by chemical-vapour deposition
3. Density and deposition rate of chemically vapour-deposited Si3N4-TiN composites
4. Kinetics and mechanism relevant to TiSiN chemical vapor deposition from TDMAT, silane and ammonia
5. A concept for the design of novel superhard coatings
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