Effects of nitrogen partial pressure and pulse bias voltage on (Ti,Al)N coatings by arc ion plating
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference8 articles.
1. Oxidation of metastable single‐phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanisms
2. Mechanical properties, structure and oxidation behaviour of Ti1-xAlxN-hard coatings deposited by pulsed d.c. plasma-assisted chemical vapour deposition (PACVD)
3. SEM image analysis of droplet formation during metal ion etching by a steered arc discharge
4. Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N films
5. Additional ion bombardment in PVD processes generated by a superimposed pulse bias voltage
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