Improving the properties of titanium nitride by incorporation of silicon
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference13 articles.
1. Oxidation kinetics of TiN thin films
2. Titanium aluminum nitride films: A new alternative to TiN coatings
3. Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al
4. Ti-Si-N films prepared by plasma-enhanced chemical vapor deposition
5. Superhard nanocrystalline composite materials: The TiN/Si3N4 system
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