A study on the characteristics of TiOxNy thin films with various nitrogen flow rate by PECVD method
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy,General Materials Science
Reference16 articles.
1. Ion beam studies of TiNxOy thin films deposited by reactive magnetron sputtering
2. Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering
3. Structural, optical and mechanical properties of coloured TiNxOy thin films
4. A study of growth and morphological features of TiOxNy thin films prepared by MOCVD
5. Optical properties of titanium oxynitride nanocrystals synthesized via a thermal liquid–solid metathesis reaction
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1. Plasma-Enhanced Atomic Layer Deposition of Titanium Oxynitride (TiOxNy) Thin Films and Their Neuromorphic Applications;ACS Applied Electronic Materials;2024-01-02
2. Hexagonal Al 2 O 3 /TiO 2 /TiN Nanotubes‐Based Sensor for CO 2 Detection;physica status solidi (RRL) – Rapid Research Letters;2022-10-06
3. Corrosion behavior of TiN layer fabricated by laser irradiation of Ti target in N2/liquid water environment;Ceramics International;2022-09
4. TiN formation on Ti target by laser ablation method under different N2 gas pressure and laser scanning cycles: A wettability study;Surfaces and Interfaces;2021-12
5. Preparation of hexagonal nanoporous Al2O3/TiO2/TiN as a novel photodetector with high efficiency;Scientific Reports;2021-09-02
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