Plasma-Enhanced Atomic Layer Deposition of Titanium Oxynitride (TiOxNy) Thin Films and Their Neuromorphic Applications-Reference-Cited by-同舟云学术

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Plasma-Enhanced Atomic Layer Deposition of Titanium Oxynitride (TiO_xN_y) Thin Films and Their Neuromorphic Applications

Published:2024-01-02 Issue:1 Volume:6 Page:319-329
ISSN:2637-6113
Container-title:ACS Applied Electronic Materials
language:en
Short-container-title:ACS Appl. Electron. Mater.

Author:

Annamalai Soundararaj¹,Dayal Gopalakrishnan¹^ORCID,Gondhalekar Jayesh¹^ORCID,Jinesh Kochupurackal B.¹^ORCID

Affiliation:

1. Electronic Materials and Devices Laboratory (EMERALD), Department of Physics, Indian Institute of Space-Science and Technology (IIST), Thiruvananthapuram, Kerala 695547, India

Funder

Department of Science and Technology, Ministry of Science and Technology, India

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsaelm.3c01343

Reference53 articles.

1. Do we have brain to spare?

2. Cell Biology of Synaptic Plasticity

3. Intrinsic and Task-Evoked Network Architectures of the Human Brain

4. Building the Human Brain

5. A Low Energy Oxide-Based Electronic Synaptic Device for Neuromorphic Visual Systems with Tolerance to Device Variation

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